Sairem所開發出次世代微波電漿源是採同軸電子迴旋（electron cyclotron resonance，ECR）設計，並搭配 solid-state 微波電源，可省卻掉傳統的磁控管及導波管，因此在硬體的架構更為精簡；此外，solid-state 微波電源可更精確地控制電源頻率，因此特別適用在需要穩定的精密製程中。透過陣列式組合，可提供均勻且大面積的電漿進行各式先進製程，例如：電漿蝕刻、PECVD及表面處理等。
Aura - Electronic Cyclotron Resonance (ECR) Plasma Source
Aura-Wave is an Electron Cyclotron Resonance coaxial plasma source. It has been designed to be self-adapted once the plasma is ignited. A magnetic field combined with the electromagnetic wave allows the creation of plasma at low pressure due to Electron Cyclotron Resonance. The Aura-Wave source has been designed to sustain microwave plasma over several decades of pressure and from a few watts, whatever the gas.
Equally, the coaxial plasma source was designed to avoid internal power-losses and has proved to be matched, i.e. no reflected power with no additional impedance matching system over 2 to 3 pressure decades, depending on the plasma gas.
The source makes it possible to reach plasma densities of a few 1011 cm-3 in multisource configuration at 10 cm from the sources.
Hi-Wave - Collisional Plasma Source
Hi-Wave is a collisional type microwave plasma source and can operate from 10-2 to 1 mbar (1 Pa to 100 Pa). It is thus intended to operate without magnets in the collisional regime. Plasma densities greater than 1012 cm-3 can be achieved in multi-source configuration with a 10 cm working distance, for most gases.
The Hi-Wave collisional coaxial plasma source was designed to avoid internal power-losses and has proved to be matched, i.e. no reflected power, with no additional impedance matching system over 1 pressure decade, depending on the plasma gas.
When combined with our solid-state microwave generator, it is possible to control the power transmitted to the plasma Watt by Watt. Low mismatching that may appear in the operating conditions can be balanced due to the variable frequency of the solid-state generator and thus extend the operating condition range of the Hi-Wave. It is designed to be used equally in industrial systems for a very large range of applications.