俊尚科技代理 SVT Associate 的各款分子束磊晶系統所使用的蒸發源（K-Cell，又可稱 Effusion Cell），可用來蒸發各種元素或化合物材料。K-Cell 均由高純度材料製成，且K-Cell 的加熱區域是由陶瓷和高熔點金屬組成，可以確保了在超高真空環境中不會出現釋氣現象，並確保蒸發源的使用壽命。K-Cell 另外具備與加熱體緊密貼合的坩堝，可以達到傳統蒸發源難以企及的穩定性和再現性；K-Cell 的坩堝形狀也經過優化設計，可有效增加材料利用率。這類蒸發源非常適用於 分子束磊晶 和一般物理氣相沉積系統，可具備良好的控制性能。
Dopant
- Excellent Choice for Dopant Applications
- Temperature Range:
0 °C – 1,400 °C - Temperature Stability:
+/- 0.1 °C
Low-Temperature
- “Hot-Lip” Filament to Prevent Condensation
- Temperature Range:
0 °C – 800 °C - Temperature Stability:
+/- 0.1 °C
High Temperature
- Stable Fluxes for Low Vapor Pressure Materials
- Temperature Range:
0 °C – 2,000 °C - Temperature Stability:
+/- 0.1 °C
Dual Filament
- Excellent Source for Desposition of Ga and In
- Temperature Range:
0 °C – 1,400 °C - Temperature Stability:
+/- 0.1 °C
Single Filament
- Sturdy All Tantalum and PBN Hot Zone
- Temperature Range:
0 °C – 1,400 °C - Temperature Stability:
+/- 0.1 °C
Hot Lip
- For III-V MBE. Excellent Source for Ga and In
- Temperature Range:
0 °C – 1,600 °C - Temperature Stability:
+/- 0.1 °C
Cold Lip
- For III-V MBE. Excellent Source for Deposition of Al
- Temperature Range:
0 °C – 1,400 °C - Temperature Stability:
+/- 0.1 °C
EXCEL
- For Organic Compounds or High Vapor Pressure Materials
- Temperature Range:
0 °C – 1,400 °C - Temperature Stability:
+/- 0.1 °C
VIKING
- Excellent Source for Ga and In.
- “Zero” Flux Transient Designed for Corrosive Environments
- Temperature Range:
0 °C – 1,400 °C - Temperature Stability:
+/- 0.1 °C