高效COPRA ICP電漿源

所有CCR Technology COPRA 的電漿源皆採無燈絲式（filamentless）低壓感應耦合RF射頻設計，電漿源內建可調式匹配網路，可讓電漿能源之傳輸效率達至最佳。而 COPRA 所產生的中性電漿（亦即電漿內有著接近等量的離子與電子，所形成的電荷平衡狀態），在導體或絕緣體基材上的薄膜沈積、蝕刻或表面改質等應用上，可有效減少電荷累積的狀態。

由於採用獨特電漿激發機制，不論製程所使用的是哪種氣體，COPRA 電漿源在氣體解離率表現均超過 90％，讓 COPRA 電漿源所產生的電漿密度可達 1x10¹²/cm³ 以上，對各種類別的應用更具重要性；各種款式的電漿源也可對應客製化的尺寸需求。CCR Technology 的 COPRA 電漿源，其特色如下：

能產生極大之離子電流密度
離子能量（Ion Energy）可獨立控制，不因RF電源的輸出大小而變化。可針對特定製程設定所需的離子能量，抑制膜質缺陷的生成
可廣泛應用於各種電漿製程，例如：離子輔助蒸鍍、離子輔助反應性濺鍍、電漿輔助化學氣相沉積、電漿表面改質與清潔、電漿蝕刻應用等

COPRA Linear Sources

LS360x200-GRPE

Plasma Opening: 360mmx200mm
Matching: Integrated Remote Match
RF Power: 5kW @ 13.56MHz
Pressure Range: 2x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): -
Substrate Width (dynamic): 300mm

LS500x500-DPRPE

Plasma Opening: 500mmx500mm
Matching: Integrated Remote Match
RF Power: 5kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): 400mmx400mm
Substrate Width (dynamic): -

LS670x203-GRPE

Plasma Opening: 670mmx200mm
Matching: Integrated Remote Match
RF Power: 5kW @ 13.56MHz
Pressure Range: 2x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): -
Substrate Width (dynamic): 600mm

LS800x250-DPRPE

Plasma Opening: 800mmx250mm
Matching: Integrated Remote Match
RF Power: 6kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): -
Substrate Width (dynamic): 700mm

LS1100x202-GRPE

Plasma Opening: 1100mmx200mm
Matching: Integrated Remote Match
RF Power: 6kW or 8kW @ 13.56MHz
Pressure Range: 3x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): -
Substrate Width (dynamic): 1000mm

LS1300x202-GRPE

Plasma Opening: 1300mmx200mm
Matching: Integrated Remote Match
RF Power: 6kW or 8kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): -
Substrate Width (dynamic): 1200mm

COPRA Ring Sources

RS400-DPR

Plasma Opening: Ø 400 mm
Matching: Integrated Remote Match
RF Power: 5kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): Ø 300 mm (12"Wafer)
Substrate Width (dynamic): -

RS500x500-DPR

Plasma Opening: 500mmx500mm
Matching: Integrated Remote Match
RF Power: 5kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): 400mmx400mm
Substrate Width (dynamic): -

RS700x600-DPR

Plasma Opening: 700mmx600mm
Matching: Integrated Remote Match
RF Power: 6kW or 10kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): 550mmx450mm
Substrate Width (dynamic): -

RS850x850-DPR

Plasma Opening: 850mmx850mm
Matching: Integrated Remote Match
RF Power: 6, 10 or 15kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): 700mmx700mm
Substrate Width (dynamic): -

RS1000x300-DPR

Plasma Opening: 1000mmx300mm
Matching: Integrated Remote Match
RF Power: 6 or 10kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): -
Substrate Width (dynamic): 900mm

RS1000x402-DPR

Plasma Opening: 1000mmx400mm
Matching: Integrated Remote Match
RF Power: 6 or 10kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): -
Substrate Width (dynamic): 900mm

COPRA Round Sources

DN 160-CF-GM

Plasma Opening: Ø 84 mm
Matching: Manual
RF Power: 0.6kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): Ø 80 mm (3"Wafer)
Substrate Width (dynamic): -

DN201-X-GM

Plasma Opening: Ø 110 mm
Matching: Manual
RF Power: 1.2kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): Ø 100 mm (4"Wafer)
Substrate Width (dynamic): -

DN250-CF-GRPE

Plasma Opening: Ø 152 mm
Matching: Remote
RF Power: 1.6kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): Ø 150 mm (6"Wafer)
Substrate Width (dynamic): -

DN251-ISO-K-EGRPE

Plasma Opening: Ø 154 mm
Matching: Integrated Remote Match
RF Power: 3kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): Ø 150 mm (6"Wafer)
Substrate Width (dynamic): -

DN401-GRPE

Plasma Opening: Ø 244 mm
Matching: Integrated Remote Match
RF Power: 5kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): Ø 200 mm (8"Wafer)
Substrate Width (dynamic): -

DN501-GRPE

Plasma Opening: Ø 380 mm
Matching: Integrated Remote Match
RF Power: 5kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): Ø 300 mm (12"Wafer)
Substrate Width (dynamic): -

COPRA Built-in Sources

IS201-G(I)R(PE)

Plasma Opening: Ø 110 mm
Matching: Integrated Remote Match
RF Power: 1.2kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): up to 760mm calotte/dome size
Substrate Width (dynamic): -

IS201-EG(I)R(PE)

Plasma Opening: Ø 110 mm
Matching: Integrated Remote Match
RF Power: 1.2kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-1 mbar
Substrate Size (static): up to 760mm calotte/dome size
Substrate Width (dynamic): -

IS301-EGIRPE

Plasma Opening: Ø 220 mm
Matching: Integrated Remote Match
RF Power: 3kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): up to 1100mm calotte/dome size
Substrate Width (dynamic): -

IS400-EGIRPE

Plasma Opening: Ø 250 mm
Matching: Integrated Remote Match
RF Power: 5kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): up to 1500mm calotte/dome size
Substrate Width (dynamic): -

IS502-EGIRPE

Plasma Opening: Ø 320 mm
Matching: Integrated Remote Match
RF Power: 7kW @ 13.56MHz
Pressure Range: 1x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): up to 2000mm calotte/dome size
Substrate Width (dynamic): -

IS1100x250-GRPE

Plasma Opening: 1100mmx250mm
Matching: Integrated Remote Match
RF Power: 6kW @ 13.56MHz
Pressure Range: 5x10^-4 ~ 1x10^-2 mbar
Substrate Size (static): -
Substrate Width (dynamic): 1000mm

Plasma Monitoring System (Faraday Cup CEA4)

The CCR Faraday Cup CEA4 Plasma Monitoring System through it allows to precisely. Out measure the plasma parameters as:

Ion Energy Distribution IED
Ion Energy
Ion Current Density
Ion Energy vs Time

Find out the best operational parameters for your existing and in particular new coater design and processes in order to ensure highest performances of your systems.