Temescal 從1952年成立至今，是一家專注於電子鎗鍍膜技術的領導者，其設備已普遍使用於LED、光學、無線通訊、二極體與功率元件等領域，尤其在化合物半導體產業（compound semiconductors），其對於薄膜均勻性的要求達到 1.0% 的嚴苛條件下，Temescal 設備在此市場的佔有率更高達 60% 以上。
Temescal 的專業技術及經驗，是客戶穩定量產、突破製程瓶頸最有力的支援，而俊尚科技代理 Temescal 已超過 20 年，這讓我們具備豐富的銷售、裝機、維修、改裝能力；此外，我們也提供原廠快速的技術 / 製程支援服務，可以快速有效的回應客戶需求，讓客戶在製程以及設備維運上無後顧之憂。各款系統的規格請參考下列內容。
Next-Gen Precision E-beam Evaporator for 200mm
有鑑於5G與節能環保風潮驅動第三代化合物半導體（GaN、SiC）的快速發展，因而催生出對於更大基材（Φ200mm）的電子束鍍膜設備的需求，Temescal的UEFC-6100將可帶給您更大的產能（25片Φ200mm晶圓 / 批次）、更快的生產週期，以及優異的基板上成膜的性能，這部份請參考下圖。
Precision E-beam Evaporators for Mass Production
FC-3800
| Wafer Size | 100mm |
|---|---|
| Production Chamber Type | Box |
| Load Lock to Isolate Production Chamber | Yes |
| Cryopump water L/sec | 21,500 |
| Pump Down Time | 1E-06 Torr, < 20mins |
| E-gun (max pkg) | 6x25cc PopTop |
| E-gun Power Supply | 6 or 12 kW |
| Max wafer count: Lift off | 25x150mm 14x200mm |
| Source to Substrate: std | 34" |
| Source to Substrate: ext | 38" |
FC-4400
| Wafer Size | 150&200mm |
|---|---|
| Production Chamber Type | Box |
| Load Lock to Isolate Production Chamber | Yes |
| Cryopump water L/sec | 44,000 |
| Pump Down Time | 1E-06 Torr, < 10mins |
| E-gun (max pkg) | 6x25cc PopTops |
| E-gun Power Supply | 6 or 12kW |
| Max wafer count: Lift off | 30x150mm 15x200mm |
| Source to Substrate: std | 38" |
| Source to Substrate: ext | 42" |
UEFC-4900
| Wafer Size | 150mm |
|---|---|
| Production Chamber Type | Conic |
| Load Lock to Isolate Production Chamber | Yes |
| Cryopump water L/sec | 36,500 |
| Pump Down Time | 1E-06 Torr, < 10mins |
| E-gun (max pkg) | 6x25cc PopTops |
| E-gun Power Supply | 6 or 12 kW |
| Max wafer count: Lift off | 25x150mm |
| Source to Substrate: std | 35.5" |
| Source to Substrate: ext | - |
UEFC-5700
| Wafer Size | 150&200mm |
|---|---|
| Production Chamber Type | Conic |
| Load Lock to Isolate Production Chamber | Yes |
| Cryopump water L/sec | 44,000 |
| Pump Down Time | 1E-06 Torr, < 10mins |
| E-gun (max pkg) | 6x25cc PopTops |
| E-gun Power Supply | 6 or 12kW |
| Max wafer count: Lift off | 42x150mm 21x200mm |
| Source to Substrate: std | 43" |
| Source to Substrate: ext | - |
E-beam Evaporators for R&D / Pilot Production
FC-2000
| Production Chamber Type | Bell jar |
|---|---|
| Load Lock to Isolate Production Chamber | No |
| Cryopump water L/sec | 4,000 |
| Pump Down Time | 1E-06 Torr，< 15mins |
| E-gun (max pkg) | 6x25cc PopTop |
| E-gun Power Supply | 6 or 12 kW |
| Max wafer count: Lift off | 42x2" 13x100mm |
| Source to Substrate: std | 19.5" |
| Source to Substrate: ext | 27.5" |
FC-2800
| Production Chamber Type | Box |
|---|---|
| Load Lock to Isolate Production Chamber | Yes |
| Cryopump water L/sec | 21,500 |
| Pump Down Time | 1E-06 Torr，< 20mins |
| E-gun (max pkg) | 6x25cc PopTop |
| E-gun Power Supply | 6 or 12 kW |
| Max wafer count: Lift off | 25x100mm 12x150mm |
| Source to Substrate: std | 34" |
| Source to Substrate: ext | 42" |