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CCR COPRA ICP Plasma Source for PECVD & Etchig

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About CCR

CCR Technology is the inventor of the COPRA Plasma Technology® and serves the supply chain of end user, original equipment manufacturers and research groups in markets like optics, solar, semiconductor, wear & decorative coatings, large area glass coatings as well as storage and display media.

The business of CCR is all around COPRA Plasma Sources based on a unique 13.56 MHz RF plasma excitation method which is superior due to its power efficiency, scalability and its reliability.

Target applications are PECVD of silicon, metal oxides and nitrides for barrier & functional layers, for optical filter stacks as for protective and wear & decorative coatings, as well as the assistence of PVD Processes as f.e. Sputter Assist or E-Gun Assist.

Market Status

CCR COPRA plasma sources are ideal for plasma-asist precision optical coatings. In Taiwan, we focus mainly on OEMs who manufacture precision optical coating systems, be it reactive sputtering machines or e-beam assist machines, for industrial customers. 

With these machines, sophisticated optical coatings are fabricated for advanced applications such as biosensor, PCR testing, LiDAR, laser diode or AR/VR. 

COPRA Round Plasma Sources
Key components to wafer-sized semiconductor or in the precision optics productions
COPRA Linear Plasma Sources
Due to their excellent homogenous distribution of the ion current densities these sources are Large Area capable
COPRA Ring Plasma Sources
Large Area PECVD high throughput source solutions for industrial coating markets
COPRA Built-in Plasma Sources
Developed for the precision optical coating
Faraday Cup Systems
Measureing plasma parameters such as:Ion Energy Distribution (IED), Ion Energy, Ion Current Density, Ion Energy vs Time


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