CCR：COPRA RF-driven plasma sources
COPRA is advanced RF-driven plasma sources, featuring high plasma density (1E12/cm³), high power coupling efficiency (up to 90%) and the independent control of Ion Energy and Ion Current Density as a function of rf-power. COPRA plasma sources have been designed for applications such as cleaning, activation, etching, PECVD, PVD-assisted and PALD-assisted.
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Sairem：microwave ECR plasma sources
2 MW-driven plasma sources with unique designs: The Aura-Wave plasma source came with a magnetic field combined to the electromagnetic wave, allowing the creation of plasma at low pressure (10E-3 mbar). The Hi-Wave plasma source has been designed to sustain over-dense microwave plasma from 10E-2 mbar to a few 10E-1 mbar and from a few watt whatever the gas.
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Temescal：PopTop multi-pocket e-guns
Temescal’s patented PopTop® e-beam sources offer enhanced convenience, reliability, and throughput in various applications. The key to these performance enhancements is Temescal’s pneumatically actuated “PopTop” crucible cover, which is raised automatically before turret rotation. The net benefit is the virtual elimination of cross-contamination.
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NovaFabrica：plasma emission monitor for plasma process
FloTron allowed users to deposit dielectric thin films exhibiting low absorption losses of such difficult materials as ZrO2, HfO2 and Al2O3 at higher deposition rates, respectively by a factor of 42, 20 and 40 as compared to conventional process. It alters the reactive gas flow, enabling the process remains stable at the same operating point throughout the deposition run.
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Colnatec：Eon-ID™ film thickness monitor
Featuring integrated touchscreen display, intuitive GUI, rackmountable enclosure, and durable construction, Eon-ID™ offers an all-inclusive design that adapts easily to a variety of settings – ranging from industrial to laboratory to clean room to research environments. Connectivity includes RS-232, usb, and WiFi options, 10 programmable relays, and 8 inputs.
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PlasGenie：effective plasma treatment system
PlasGenie is a desktop plasma cleaning system featuring 300W RF power generator with automatic matching network, effective CCP RIE-type plasma source which concentrates energy in the area of 4-inch diameter and precise gas flow control with MFC. PlasGenie is an ideal tool for R & D laboratories, capable of surface cleaning, activation, etching and so on.
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