RF Plasma-assisted CVD

ccr

 

PECVD is a highly efficient deposition technology where the plasma is cracking the molecules and chemical reactions occur to form the layer. CCR's CORPA PECVD systems feature the highest throughput performances of excellent quality films, lowest energy footprints and easy maintenance & operation. We believe these are key factors for advanced PECVD applications.

CCR´s proprietary COPRA PECVD plasma sources are RF-ICP coupled high plasma density sources enabling great control over the directionality of the ions also at lower pressure ranges for a wide range of PECVD applications. The COPRA plasma sources for PECVD markets and applications are scalable for large area applications and due to their high compatibility with corrosive gases suitable for countless applications. The COPRA RF-ICP technology represents an industrial proven quasi neutral beam RF-ICP plasma source solution with process efficiencies which will make you want to plan your industrial thin film coating needs with our PECVD technique.