Microwave Plasma-assisted CVD
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Highly oriented diamond thin film using CYRANNUS systems |
iPLAS is a Germany-based manufacturer, famous for their CYRANNUS microwave-assisted PECVD systems. The CYRANNUS PEVCD systems have been designed with iPLAS's ECR microwave plasma source, which ensures high plasma density for the process and adopts Sairem's industry-proven microwae generator, which guarantees stable performance throughout the process. With these features, CRYANNUS PECVD systems can be used in advanced applications such as UNCD (Ultrananocrystalline Diamond) deposition, technical diamond growth, adhesion improvement, selective etching, gas activation, abatement and so on. All CYRANNUS microwave-assisted PECVD systems are custom-designed using standard modules, please contact us for more information.
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Although there's no standard specification, below is a simplified guide whcih will help you better understand the key points in determining your specification.
| Specification | Description |
| Plasma Source |
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| Microwave |
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| Tuner |
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| Substrate Holder |
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| Vacuum |
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| Process Gas |
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| Automation |
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| Safety |
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