Optical coating refers to one or more thin layers of material (metal or dielectric) deposited on an optical component such as a lens or mirror, which alters the way in which the optic reflects and transmits light. One type of optical coating is an antireflection coating, which reduces unwanted reflections from surfaces, and is commonly used on spectacle and photographic lenses. Another type is the high-reflector coating which can be used to produce mirrors which reflect greater than 99.99% of the light which falls on them. More complex optical coatings exhibit high reflection over some range of wavelengths, and anti-reflection over another range, allowing the production of dichroic thin-film optical filters. High tech applications of optical coating include tele-communication, display, satellite communication, semiconductor laser diode, MEMS, bio-chips and so on.
Our optical deposition systems (based on e-beam & reactive sputtering technology) is capable of fabricate the most complicated optical coatings based on optical simulation. Parameters regarding layer stacks, layer thickness, layer uniformity, and layer chemical composition are controlled by PLC via user friendly GUI.
Our newly designed family of coaters offer solutions to processing requirements that range from small scale R&D or preproduction applications to large scale, high volume production fabrication lines. In addition, our coaters are designed to optimize flexibility and efficiency in installation as well as operation. Fully automated processing via the Temescal control system maximizes throughput as well as ease of use.
CCR COPRA Plasma Sources
The IS200-E all typical energy ranges required to assist the typical evaporating materials and cover calotte or dome sizes up to 760 mm. Easy installation and maintenance, these plasma sources contribute to optimize your coating costs. No arcing and no spikes on substrates and films. No filament and no electron emission grid needed. Variable RF-power independent ion energy settings allow to perform your film with the exact energy values you will need to prevent surface from damages and stress build-up.
JianFu MGS sputtering systems have been designed for various kinds of R&D applications. MGS's inherent flexibility in hardware configuration enables us to deliver the most suitable MGS machine based on customers' specific demands. MGS systems include features such as user friendly GUI via touch screen, PLC controlling system, datalogging, accessories (e.g. PEM / QCM for process monitoring) and so on.
CCR COPRA Plasma Sources
The IS200-E all typical energy ranges required to assist the typical evaporating materials and cover calotte or dome sizes up to 760 mm. Easy installation and maintenance, these plasma sources contribute to optimize your coating costs. No arcing and no spikes on substrates and films. No filament and no electron emission grid needed. Variable RF-power independent ion energy settings allow to perform your film with the exact energy values you will need to prevent surface from damages and stress build-up.
