Microwave Plasma Tools

Despite of thin film deposition technology, Junsun also seeks for potential applications using microwave tools, for these technologies may have great commercial potentials.

  • Microwave-driven plasma:microwavepdriven plasama has higher plasma density than RF-driven plasma, therefore microwave-driven plasma can effectively modify (clean, activate, etch or implant ion) surface properties. Industries have been using this technology in fileds such as semiconductors, electronics, biomaterials and so on. There's also a growing interest in using microwave-driven plasma to fabricate diamond thin film for some advanced applications.

  • Microwave extraction:this technology uses microwave to excite molecular dipoles of samples and the excited dipole movement generates tremendous amount of heat. Samples being heated this way can release the chemical compound of interest more effectively than tradtional methods. 

{slider title="Microwave-driven Plasma Source" open="false"}

It is known that microwave-driven plasma at 2.54 GHz can have plasma density of 1011 cm-3. Thanks to its high plasma density, this technology can be applied to applications such as etching, PECVD, large scale surface treatment, sterilization and so on. Microwave-driven plasma also has benefits such as low processing temperature (especially good for polymers) and no charge accumulation (plasma damage). There are several types of microwave plasma source, we would like to propose Sairem's ECR microwave plasma sources to you.

ECR SourceProduce Description
aura wave source
  • Aura-Wave has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure
  • In multi-source set up, and thanks to SAIREM solid state microwave modules, Aura-Wave is ideal for the production of large volumes of plasma at operating pressures between 10-3 mbar and 10-1 mbar, allowing to obtain plasma density up to a few 1011 cm-3 in different gases.
  • Combined with Sairem solid-state microwave generator, this source can maintain plasmas at power levels starting with 1 W. For small mismatches due to operating condition limitations, it is always possible to vary the frequency of the solid state generator to match the impedance.
hi wave source
  • Hi-Wave has been designed to sustain over-dense microwave plasma from 10-2 ~ 10-1 mbar and from a few watt whatever the gas
  • In multi-source set up – matrix or crown configurations – Hi-Wave is ideal for the treatment of large surfaces at operating pressures between 10-2 mbar and a few 10-1 mbar and allows to obtaining over-dense plasmas, plasma density higher than 1012 cm-3
  • Combined with Sairem solid-state microwave generator, this source can maintain plasma at power levels starting from a few W. To correct small mismatches due to change in operating conditions, the variable frequency function of the solid state generator helps with impedance matching.
  • Speical Application:diamond film deposition

{slider Microwave Extraction System}

Traditional extration methods include Soxhlet extraction, maceration, percolation, turbo-extraction, sonication and so on. However these methodes have following drawbacks: time-consuming, not environmentally friendly (use huge amount of solvents during the extraction process) and poor extraction efficiency. Microwave is the way to go. Below is a comparison between traditional extraction methods and microwave extraction.

microwave comparison

 

Junsun delivers below microwave extraction systems for R&D applications. Please contact us for more product information!

System AppearanceProduct Description
MiniLabotron 2000 sairem

Minilabotron 2000 

  • Application:chemical extraction & synthesis in R&D laboratories
  • Microwave Generator:Built-in microwave generator (2.54 GHz, 2 kW)
  • Batch-type design, Minilabotron 2000 can use continuous flow reactor (horizontal / vertical column / SPIN)
  • Matching network provided, can reduce reflected power and optimize extraction efficiency
LabotronXS 2kW sairem

Labotron XS

  • Application:chemical extraction & synthesis in R&D laboratories
  • Microwave Generator:Built-in microwave generator (2.54 GHz, 2/6 kW)
  • Batch-type design, Labotron XS can use SPIN continuous flow reactor
  • Matching network provided, can reduce reflected power and optimize extraction efficiency